NanoMaker-Editor now FREE. Download newest version Build: 13.05.13

NanoMaker-Editor Build: 13.05.13

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Size: 1 MB $ 44.95 License: Shareware

NanoMaker-Editor is a Education::Mathematics software developed by ST Services. After our trial and test, the software was found to be official, secure and free. Here is the official description for NanoMaker-Editor:

NanoMaker is a powerful software/hardware system for SEM/FIB based lithography that is intended for state-of-the-art technology of designing and manufacturing micro and nano electronic devices and objects.

Trial version of NanoMaker-Editor is limited to number of elements in structure to be exported.

Why NanoMaker?

NanoMaker provides a unique set of possibilities for nanotechnologies.
  • It is supplied with friendly graphic editor to design hierarchical structures of any size and shape arranged to any level of complexity.
  • Makes simulation of resist development.
  • Calculates exposure dose values/times considering proximity effect correction for 2D/3D structures.
  • Compensates static distortion of e-beam deflecting system.
  • Significantly reduces total exposure time by actively suppressing dynamic delays of e-beam deflection.
  • Can be used as diagnostic tool for creation of high-resolution panoramic view of large-scale (centimeters) micro objects.

Purposes:

  1. To convert any scanning electron microscope (SEM) into an e-beam lithograph.
  2. To provide an ultimate resolution of lithography with a certain setup (including industrial lithographs). To achieve this:
    1. make correction for proximity effect during data preparation for lithography
    2. compensate for the distortion and delays of scanning system during exposure and image acquisition
    3. compensate for the system drift at prolonged exposure
  3. To predict results of lithography by simulating.
  4. To ensure adjustment for various configurations of lithographic equipment, for the presence or absence of beam blanking systems, stages, etc.
  5. To create three-dimensional structures in a resist.
  6. To familiarize user with the basic principles of lithography.


Scanning Electron Microscope controlled by NanoMaker

Applications:

  • Microelectronics
  • Nanotechnology
  • 3D nano-micro patterning
  • Diffractive optics (synthetic holograms) for visible and X-ray range
  • Digital microscopy

Easily installed on:

  • SEM's (JEOL, LEO, ZEISS, HITACHI, PHILIPS, FEI, TESCAN,...)
  • Focused Ion Beam machines
  • STM/AFM's

System Requirements:

  • i486 or Pentium-class processor
  • Microsoft Windows 98/Me/NT 4.0/2000/XP/Vista/7
  • 64 MB of RAM
  • 20 MB of available hard-disk space
For more information visit our homepage: http://nmaker.ru or http://nanomaker.com.

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NanoMaker is a powerful software/hardware system for SEM/FIB based lithography that is intended for state-of-the-art technology of designing and manufacturing micro and nano electronic devices and objects.

Trial version of NanoMaker-Editor is limited to number of elements in structure to be exported.

Why NanoMaker?

NanoMaker provides a unique set of possibilities for nanotechnologies.
  • It is supplied with friendly graphic editor to design hierarchical structures of any size and shape arranged to any level of complexity.
  • Makes simulation of resist development.
  • Calculates exposure dose values/times considering proximity effect correction for 2D/3D structures.
  • Compensates static distortion of e-beam deflecting system.
  • Significantly reduces total exposure time by actively suppressing dynamic delays of e-beam deflection.
  • Can be used as diagnostic tool for creation of high-resolution panoramic view of large-scale (centimeters) micro objects.

Purposes:

  1. To convert any scanning electron microscope (SEM) into an e-beam lithograph.
  2. To provide an ultimate resolution of lithography with a certain setup (including industrial lithographs). To achieve this:
    1. make correction for proximity effect during data preparation for lithography
    2. compensate for the distortion and delays of scanning system during exposure and image acquisition
    3. compensate for the system drift at prolonged exposure
  3. To predict results of lithography by simulating.
  4. To ensure adjustment for various configurations of lithographic equipment, for the presence or absence of beam blanking systems, stages, etc.
  5. To create three-dimensional structures in a resist.
  6. To familiarize user with the basic principles of lithography.


Scanning Electron Microscope controlled by NanoMaker

Applications:

  • Microelectronics
  • Nanotechnology
  • 3D nano-micro patterning
  • Diffractive optics (synthetic holograms) for visible and X-ray range
  • Digital microscopy

Easily installed on:

  • SEM's (JEOL, LEO, ZEISS, HITACHI, PHILIPS, FEI, TESCAN,...)
  • Focused Ion Beam machines
  • STM/AFM's

System Requirements:

  • i486 or Pentium-class processor
  • Microsoft Windows 98/Me/NT 4.0/2000/XP/Vista/7
  • 64 MB of RAM
  • 20 MB of available hard-disk space
For more information visit our homepage: http://nmaker.ru or http://nanomaker.com. you can download NanoMaker-Editor Build: 13.05.13 free now.


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Platforms: Win95,WinNT,Windows 2000,WinXP,Win98,WinME,Windows XP x64,Windows Vista,Windows Vista x64,Windows 7
Publisher: About ST Services | ST Services titles | Visit ST Services
Downloads: 0 last month, 135 total
Last updated: More than a year ago ()
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